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Home / Comics / E-Beam resist – Nanofabrication at Harvard CNS – Ep2

E-Beam resist – Nanofabrication at Harvard CNS – Ep2

May 17, 2018 By sky Leave a Comment

Summary

PMMA and ZEP520 are the most popular positive E-beam resists with high resolution capability. ZEP520 is well-known for high sensitivity and etch durability but is expensive. Note that The resist performance, contrast, sensitivity and resolution depends strongly on the development process.

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Parking when visiting harvard CNS
P1
Public parking around the Harvard CNS is not easy. To make your visit easy buy a daily visitor parking permit online in advance and print out it. The 52 Oxford Street Garage is the closest to the Harvard CNS.
Register IRIS ID system to enter the cleanroom
P2
Harvard CNS users should register IRIS eye scan access system to enter the cleanroom
Ebeam resist Zep520A is much more expensive than PMMA
P3
There are two popular positive E-beam resists. ZEP520 is very expensive compared to PMMA
Check the spin curves of the E-beam resist you use. Your desired resist thickness will give the spin speed
P4
Check the spin curves of the E-beam resist you use. Your desired resist thickness will give the spin speed
ZEP520A develop process
P5
The resist performance, contrast, sensitivity and resolution depends strongly on the development process. It is suggested to understand the different developers for PMMA and ZEP520.
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Filed Under: Comics, nanofabrication, Nanotechnology Tagged With: E-beam resist, Electron beam lithography, Harvard CNS, nanofabrication, nanotechnology, semiconductor

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