Summary
Migration toward next nod scaling of semiconductor device forces the equipment manufactures to develop new process technology to meet the more stringent specifications and to overcome the process challenges of the new technology nod. To ensure the process quality of newly developed technologies, customized test structures are developed. In Boston region Harvard CNS is used for nanofabrication of prototypes.
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A prototyping project was approved
A design layout of ptototye structure
Process challenges in nanofabrication of the test structures
Gold improves image contrast in SEM
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- Ep1
- Ep2
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