Summary The main criteria for choosing the appropriate resist depend on the minimum feature size, sensitivity, contrast and etching resistance. There is a large … [Read more...] about Nanofabrication at Harvard CNS : E-beam resist – Ep3
nanotechnology
E-Beam resist – Nanofabrication at Harvard CNS – Ep2
Summary PMMA and ZEP520 are the most popular positive E-beam resists with high resolution capability. ZEP520 is well-known for high sensitivity and etch … [Read more...] about E-Beam resist – Nanofabrication at Harvard CNS – Ep2
Test Structures to measure the Implant Beam Angle for accurate beam control
Summary Beam angle information from nanoscale electrical test structure can provide high resolution wafer maps of the horizontal and vertical incident beam angle … [Read more...] about Test Structures to measure the Implant Beam Angle for accurate beam control