Summary
Plasma process monitoring requires high speed data acquisition (>10MS/s) to detect transient changes in short DC voltage and current waveforms. Very large data (60MB/s for 3ch) is acquired and Diadem programing is necessary to do post analysis.
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NI-Diadem is essential software to do post analysis of very large data recorded from high speed data acquisition system.
An application fo NI-Diadem for plasma doping process monitoring.
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