Summary In electron beam lithography, any larger pattern than a writing field is subdivided into multiple writing fields. If writing field alignment isn't … [Read more...] about Things to know before doing E-Beam lithography at Harvard CNS: Ep2
nanofabrication
Things to know before doing E-Beam lithography at Harvard CNS: Ep1
Summary This comic explains what you need to know before doing electron beam lithography with Elionix systems at Harvard CNS: system, beam spot size, shot pitch, … [Read more...] about Things to know before doing E-Beam lithography at Harvard CNS: Ep1
Nanofabrication at Harvard CNS : E-beam resist – Ep3
Summary The main criteria for choosing the appropriate resist depend on the minimum feature size, sensitivity, contrast and etching resistance. There is a large … [Read more...] about Nanofabrication at Harvard CNS : E-beam resist – Ep3
E-Beam resist – Nanofabrication at Harvard CNS – Ep2
Summary PMMA and ZEP520 are the most popular positive E-beam resists with high resolution capability. ZEP520 is well-known for high sensitivity and etch … [Read more...] about E-Beam resist – Nanofabrication at Harvard CNS – Ep2
Nanofabrication at Harvard CNS : E-beam resist – Ep1( Getting ready)
Summary Migration toward next nod scaling of semiconductor device forces the equipment manufactures to develop new process technology to meet the more stringent … [Read more...] about Nanofabrication at Harvard CNS : E-beam resist – Ep1( Getting ready)
하버드대 CNS 나노팹에서 소자제조 – Ep1
(Getting ready)
Summary
차세대 반도체소자 개발은 새로운 공정기술의 요구와 더불어 반도체 장비의 기술 개발을 유도하는데 새롭게 개발된 기술의 성능평가를 위해 맟춤형 test structure의 제작이 요구된다. Prototype structure의 Nanofabrication을 위해 … [Read more...] about 하버드대 CNS 나노팹에서 소자제조 – Ep1
(Getting ready)