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Home / Archives for nanofabrication

nanofabrication

Things to know before doing E-Beam lithography at Harvard CNS: Ep2

November 10, 2018 By sky Leave a Comment

Summary In electron beam lithography, any larger pattern than a writing field is subdivided into multiple writing fields. If writing field alignment isn't … [Read more...] about Things to know before doing E-Beam lithography at Harvard CNS: Ep2

Filed Under: Comics, E-beam lithography, Nanotechnology Tagged With: Electron beam lithography, Harvard CNS, nanofabrication

Things to know before doing E-Beam lithography at Harvard CNS: Ep1

October 29, 2018 By sky Leave a Comment

Summary This comic explains what you need to know before doing electron beam lithography with Elionix systems at Harvard CNS: system, beam spot size, shot pitch, … [Read more...] about Things to know before doing E-Beam lithography at Harvard CNS: Ep1

Filed Under: Comics, E-beam lithography, Lithography, nanofabrication, Nanotechnology Tagged With: E-Beam lithography, Harvard CNS, nanofabrication

Nanofabrication at Harvard CNS : E-beam resist – Ep3

May 18, 2018 By sky Leave a Comment

Summary The main criteria for choosing the appropriate resist depend on the minimum feature size, sensitivity, contrast and etching resistance. There is a large … [Read more...] about Nanofabrication at Harvard CNS : E-beam resist – Ep3

Filed Under: Comics, nanofabrication, Nanotechnology Tagged With: E-beam resist, Electron beam lithography, Harvard CNS, nanofabrication, nanotechnology, semiconductor

E-Beam resist – Nanofabrication at Harvard CNS – Ep2

May 17, 2018 By sky Leave a Comment

Summary PMMA and ZEP520 are the most popular positive E-beam resists with high resolution capability. ZEP520 is well-known for high sensitivity and etch … [Read more...] about E-Beam resist – Nanofabrication at Harvard CNS – Ep2

Filed Under: Comics, nanofabrication, Nanotechnology Tagged With: E-beam resist, Electron beam lithography, Harvard CNS, nanofabrication, nanotechnology, semiconductor

Nanofabrication at Harvard CNS : E-beam resist – Ep1( Getting ready)

April 25, 2018 By sky Leave a Comment

Summary Migration toward next nod scaling of semiconductor device forces the equipment manufactures to develop new process technology to meet the more stringent … [Read more...] about Nanofabrication at Harvard CNS : E-beam resist – Ep1( Getting ready)

Filed Under: Comics, nanofabrication, Nanotechnology Tagged With: alignment marks, E-beam resist, Harvard CNS, nanofabrication, prototyping

하버드대 CNS 나노팹에서 소자제조 – Ep1
(Getting ready)

April 24, 2018 By sky Leave a Comment

Summary 차세대 반도체소자 개발은 새로운 공정기술의 요구와 더불어 반도체 장비의 기술 개발을 유도하는데 새롭게 개발된 기술의 성능평가를 위해 맟춤형 test structure의 제작이 요구된다. Prototype structure의 Nanofabrication을 위해 … [Read more...] about 하버드대 CNS 나노팹에서 소자제조 – Ep1
(Getting ready)

Filed Under: Comics, nanofabrication, Nanotechnology Tagged With: Harvard CNS, nanofabrication, prototyping, 나노팹, 하버드대 CNS

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