Summary
Plasma process monitoring requires high speed data acquisition (>10MS/s) to detect transient changes in short DC voltage and current waveforms. Very large data (60MB/s for 3ch) is acquired and Diadem programing is necessary to do post analysis.
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![Very large data analysis by using NI-Diadem - P1](http://vonoff.com/comics/Diadem-p1.jpg)
![NI-Diadem to do very large data recorded from high speed data acquisition](http://vonoff.com/comics/Diadem-p2.jpg)
NI-Diadem is essential software to do post analysis of very large data recorded from high speed data acquisition system.
![What is diadem and its application for plasma doping process monitoring](http://vonoff.com/comics/Diadem-p3.jpg)
An application fo NI-Diadem for plasma doping process monitoring.
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Become a sponsor of SkyKO comics
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