Summary
Thermal Wave(TW) technique can be used to monitor the micro-uniformity beam angle performance in ion implantation. Let’s start with TW measurement theory
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The higher the implant dose is, the higher the TW value is
TW technique measures the extent of damage created by ion implantation by detecting the sample reflectance variation that is temperature-dependent. The variation is induced by a modulated pump laser beam.
In TW technique, a probe laser measures the change of sample’s refractive index induced by a modulated pump laser
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Reference
- “US8817260B2 – Modulated Reflectance Measurement System Using UV Probe.” Google Patents, 26 Aug. 2014, patents.google.com/patent/US8817260B2/en.
- Rosencwaig, Allan. “PROCESS CONTROL IN IC MANUFACTURING WITH THERMAL WAVES.” Iowa State University Digital Repository,Therma-Wave Inc.
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