Summary
Some development issues related to plasma doping for mass production are plasma uniformity, particle and micro-arcs control.
SkyKo Comics and videos about Semiconductor and nanotechnology | 반도체 만화
Some development issues related to plasma doping for mass production are plasma uniformity, particle and micro-arcs control.
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Test Structures to measure the Implant Beam Angle for accurate beam control
Implant damage control and junction leakage measurement
Conformal Doping Test Structure for PLAD process qualification
Mapping wafer temperature spatial distribution
Plasma doping/PIII advantages over beamline implantation
Dose accuracy in plasma doping
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