Summary High resolution micro-uniformity map of ion beam angle is valuable to monitor beam quality control performance of an ion implanter. It provides details … [Read more...] about Ion beam angle uniformity wafer mapping using TW V-curves: Ep2
implantation
How to monitor plasma ion implantation process for fault detection?
Summary How to ensure the dose accuracy of the plasma doping or PIII system. What algorithm does the dose controller use to integrate Faraday currents?. How to … [Read more...] about How to monitor plasma ion implantation process for fault detection?
Dose accuracy in plasma doping
Summary Unlike Beamline, accurate dose measurement is a big challenge for plasma immersion doping. The simple integration of the faraday current can't accurately … [Read more...] about Dose accuracy in plasma doping
Mapping wafer temperature spatial distribution
Summary A custom-made probe wafer with RTD sensor provides wafer temperature spatial distribution map by measuring transient temperature distribution in a … [Read more...] about Mapping wafer temperature spatial distribution