Summary Plasma process monitoring requires high speed data acquisition (>10MS/s) to detect transient changes in short DC voltage and current waveforms. Very … [Read more...] about NI-Diadem for plasma doping process monitoring
plad
Plasma doping process issues
Summary Some development issues related to plasma doping for mass production are plasma uniformity, particle and micro-arcs control. … [Read more...] about Plasma doping process issues
Conformal Doping Test Structure for PLAD process qualification
Summary Test structure method to probe doping conformality enables the automated measurement of nano-scale sidewall electrical depth profile and provides a wafer … [Read more...] about Conformal Doping Test Structure for PLAD process qualification