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Optical lithography trend

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Summary

Lithography technology continues to reduce the wavelength to 13.5nm EUV from 193nm ArF today. EUV will print fine pattens below 24nm half-pitch.

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Reference

  1. ITRS Roadmap- Lithography 2013
  2. Mordechai Rothschild etc, “Recent Trends in Optical Lithography” Lincoln Laboratory Journal,Vol14, Number 2, 2003, pp. 221-233
  3. Martin van den Brink, “Litho today, litho tomorrow”, ASMLSmallTalk2016
  4. The Intel lithography Roadmap

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