Summary Lithography technology continues to reduce the wavelength to 13.5nm EUV from 193nm ArF today. EUV will print fine pattens below 24nm half-pitch. … [Read more...] about Optical lithography trend
Nanotechnology
NI-Diadem for plasma doping process monitoring
Summary Plasma process monitoring requires high speed data acquisition (>10MS/s) to detect transient changes in short DC voltage and current waveforms. Very … [Read more...] about NI-Diadem for plasma doping process monitoring
The Emergency – SC1 wet chemical clean induced yield drop
Summary Al contaminants introduced from the SC-1 solution are responsible for the threshold voltage shift and GOI degradation after thermal treatment. … [Read more...] about The Emergency – SC1 wet chemical clean induced yield drop
Plasma doping process issues
Summary Some development issues related to plasma doping for mass production are plasma uniformity, particle and micro-arcs control. … [Read more...] about Plasma doping process issues
3D C-V measurement to detect slow traps
Summary The 3D C-V technique is a simple method to measure the energy and concentration profile of the slow traps located in the oxide near the Si-SiO 2 … [Read more...] about 3D C-V measurement to detect slow traps
Mapping wafer temperature spatial distribution
Summary A custom-made probe wafer with RTD sensor provides wafer temperature spatial distribution map by measuring transient temperature distribution in a … [Read more...] about Mapping wafer temperature spatial distribution
Conformal Doping Test Structure for PLAD process qualification
Summary Test structure method to probe doping conformality enables the automated measurement of nano-scale sidewall electrical depth profile and provides a wafer … [Read more...] about Conformal Doping Test Structure for PLAD process qualification
Implant damage control and junction leakage measurement
Summary Wafer temperature during implantation has a significant effect on the amorphous layer thickness and EOR damage that affects junction leakage current. … [Read more...] about Implant damage control and junction leakage measurement