Summary DRAM finds itself in a corner as newer and more advanced memories start to emerge. Can DRAM overcome its physical scaling limit and stay relevant? … [Read more...] about A trip down memory lane -#2: The sorrow of DRAM scaling challenge
A trip down memory lane -#1: Memory to reduce latency gap
Summary Processors and memory have always differed in priorities, creating an ever-increasing latency gap. New memory types have been introduced to bridge this … [Read more...] about A trip down memory lane -#1: Memory to reduce latency gap
Optical lithography trend
Summary Lithography technology continues to reduce the wavelength to 13.5nm EUV from 193nm ArF today. EUV will print fine pattens below 24nm half-pitch. … [Read more...] about Optical lithography trend
Gold collection movement in the 1997-98 Korean financial crisis
Summary A shadow of gold collection campaign in the crisis of the Korean Financial Crisis of 1997-98. People donated their owned gold for the love of Korea but … [Read more...] about Gold collection movement in the 1997-98 Korean financial crisis
NI-Diadem for plasma doping process monitoring
Summary Plasma process monitoring requires high speed data acquisition (>10MS/s) to detect transient changes in short DC voltage and current waveforms. Very … [Read more...] about NI-Diadem for plasma doping process monitoring
May 19, 1980 in Kwangju, Korea
Preface A fictional story about what happened at a high school in May 19, 1980, the day after the Gwangju Uprising. Anyone who is interested … [Read more...] about May 19, 1980 in Kwangju, Korea
The Emergency – SC1 wet chemical clean induced yield drop
Summary Al contaminants introduced from the SC-1 solution are responsible for the threshold voltage shift and GOI degradation after thermal treatment. … [Read more...] about The Emergency – SC1 wet chemical clean induced yield drop
Plasma doping process issues
Summary Some development issues related to plasma doping for mass production are plasma uniformity, particle and micro-arcs control. … [Read more...] about Plasma doping process issues